The KRI^® products incorporate a range of plasma technology. These technologies offer unique operation and performance specifications. The range of technologies allows the application of the correct ion source and power supply product to meet the process objectives. The technologies are classified into basic four categories:

1. Gridless Plasma Source Technology
2. Gridded Ion Source Technology
3. Electron Source Technology
4. Power Supply and Control Technology.

These KRI^® products are process tools which are employed in the fabrication of materials at the atomic scale. Our products are successfully implemented in numerous of deposition and etching applications. Because of stable and productive performance of our products, new enabling process applications are being engineered. Besides, these frontier applications, our products are leading process tools used in a common set of ion source applications. A list of these applications is given below:

Common Process Applications*

Process	Abbreviations
In-Situ Substrate Preclean	PC
Ion Beam Modification of Material & Surface Properties	IBMM
Ion Beam Assisted Deposition	IBAD
Ion Beam Etching	IBE
Reactive Ion Beam Etching	RIBE
Chemically Assisted Ion Beam Etching	CAIBE
Ion Beam Sputter Deposition	IBSD
Reactive Ion Beam Sputter Deposition	RIBSD
Biased Target Ion Beam Sputter Deposition	BTIBSD
Direct Deposition	DD
Hard and functional coatings	DLFC
* see Processes Page for more details

Our product range is comprehensive, offering products to serve different customer needs. Our customer profile ranges in size, process goal and installation. For example, the perspective of our customers can be multifaceted:

1. Large manufacturers who operate multiple ion source products in their fabrication facility,
2. Original equipment manufacturer (OEM) who integrate our product into their vacuum process systems.
3. Research scientists who may be investigating the latest nanotechnology devices.