Processes

KRI's products are used in a vacuum environment to deposit thin films, dry etch nanostructures and modify surface properties.

The following table lists common material processes where KRI products are employed.

Common Process Applications
Process Identification	Common Acronyms
In-Situ Substrate Preclean	PC
Ion Beam Modification of Material & Surface Properties	IBSM
-Surface polishing or smoothing
-Surface nano structures and texturing
-Ion figuring and enhancement
-Ion trimming and tuning
-Surface activated bonding	SAB
Ion Beam Assisted Deposition	IBAD
Ion Beam Etching	IBE
-Reactive Ion Beam Etching	RIBE
-Chemically Assisted Ion Beam Etching	CAIBE
Ion Beam Sputter Deposition	IBSD
-Reactive Ion Beam Sputter Deposition	RIBSD
-Biased Target Ion Beam Sputter Deposition	BTIBSD
Direct Deposition	DD
-Hard and functional coatings

Examples of Ion Beam Process Systems