| Our equipment is employed in vacuum environments where high purity material processing is the objective. Used in the deposition of thin films and etching of surfaces, our products are process tools applied in the fabrication of structures with critical dimensions, ranging from the micrometer to sub nanometer scale. |
| Because of the high precision capability, our products are engaged in creating material systems and surface features with atomic level control. Those who have benefited from this precision include: |
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1) vacuum coating engineers have been able to grow and control thin films with thicknesses of several monolayers.
2. process scientists have been able to etch wafers with tight uniformities and critical geometrical specifications. |
Our technology has proven to be valuable process tools in a number of industries, technologies and sciences, reaching into a variety of fields. Some of the typical areas where our technology has been applied include the following fields: |
- Precision optics
- Ophthalmic
- Photonic/Optoelectronics
- Data storage
- Semiconductor
- High frequency electronics
- RF / microwave
- Material Analysis
- Wear & corrosion protection
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- MEMS
- Aerospace
- Sensors
- Flat panel displays
- Organic flexible displays
- Solar conversion
- Superconductors
- Medical
- Tribology
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| Relatively new as a material process technology, ion source applications have steadily grown. As the virtues of ion beam process capabilities become discovered, process engineers and researchers have achieved desirable film and surface properties which were previously not attainable without the use of our technology. Today, our products are applied in commonly accepted processes. Some of these uses are listed below: |
| 1) In precision optics; dense and stable films with optimized refractive indices and low absorption. |
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| 2) In consumer eyewear; high throughput manufacturing of durable AR coatings which adhere to plastic lenses. |
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| 3) In photonics and lasers; smooth, low scatter and optically pure films with high laser induced damage thresholds. |
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| 4) In semiconductors; reproducible adhesion of metal coatings for high yield lift-off processes. |
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5) In MEMS, sensors and displays; surface modification and texturing to amplify surface work functions. |
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| 6) In magnetic data storage; anisotropic and uniform etching of nanometer features in metal and dielectric multilayer stacks. |
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| 7) In medical sensors; hard and corrosion resistant organic coatings which exhibit designable biological activity. |
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